摘要
在氩氧混合气氛中,常温下用脉冲磁控溅射方法在石英玻璃和硅片上制备了V2O5薄膜。用X射线衍射、X射线光电子谱和原子力显微镜对薄膜微观结构进行了测试,用分光光度计测量从200～2500nm波段V2O5薄膜的透射和反射光谱。结果表明,常温下制备的V2O5薄膜为非晶结构,光学能隙为2.46eV。
Vanadium pentoxide films were deposited on quartz glass and silicon substrates using a vanadium target and pulse magnetron reactive sputter Ar/O2 discharges at room temperature. The surface morphology and structural features were studied by XRD,XPS and AFM to ensure the growth of V2O5 films. Optical transmission and reflection characteristics were measured by spectroscopy from 200 nm to 2 500 nm wavelength region. The investigations revealed that V2O5 films were amorphous and optical band gap (Eg )was about 2.46 eV.
出处
《真空与低温》
2003年第3期134-137,共4页
Vacuum and Cryogenics
