摘要
本文采用一种新型的等离子体浸没式离子注入 离子束增强沉积的技术(PIII IBAD),在Cr12MoV钢基体上制备出了TiN膜,对沉积膜的组织进行了光电子能谱分析,并对沉积膜进行了硬度检测、摩擦试验及磨痕形貌分析。试验结果表明,沉积膜中的组织为TiN、TiO2和Ti2O3,TiN膜具有高达Hv3200的高硬度和极其优良的摩擦性能。
The TiN film is prepared on the substrate of Cr12MoV steel by means of plasma immersion ion implantationion beam assisted deposition (PIIIIBAD). The structure and the tribological property including microhardness, friction coefficient and wearing traces are investigated respectively with Xray photoelectron spectroscopy (XPS), hardness tester, sliding friction tests and scanning electron microscopy (SEM). The results indicate that the structure of the film is consisted of TiN, TiO2 and Ti2O3 and the film possesses high hardness up to Hv3200 and high wearing capacity.
出处
《材料开发与应用》
CAS
2003年第5期17-20,共4页
Development and Application of Materials
基金
中国科学院上海微系统与信息技术研究所离子束重点实验室应用基础研究基金(10002)
