射频溅射ZrO_2薄膜的摩擦学特性

Microstructure and mechanical properties of R. F. magnetron reactively sputtered ZrO_2 thin film

利用磁控射频反应溅射方法制备了 ＺｒＯ２薄膜。分析了工艺对薄膜结构的影响，结构与摩擦学特征的关系。研究表明，氧分压和基片温度是影响薄膜结构，从而影响其摩擦学特性的关键因素。

ZrO2 thin films were deposited by R. F. magnetron reactively sputtering method. A pure metal Zr target was employed in the film deposition. The stoichiometry, crystallinity, microhardness. toughness, and wearability of the films were examined. From which, the correlation between deposition process, film structure, and properties is estabilished. The studies show that the substrate heating and oxygen partial pressure are the cristical parameters that alter the film microstruture and affect their mechanical properties.