双层减反射膜的研究

THE PREPARATION OF DOUBLE LAYER ANTIREFLECTION COATING

我们采用电子束蒸发淀积得到了光学(折射率)匹配良好的Ta_2O_5和SiO_2体系,Ta_2O_5和SiO_2膜的折射率分别为2.15和1.45。测定了0.3—0.9μm光谱范围内Ta_2O_5单层膜的透过率和双层膜在0.4—0.9μm范围内的反射率分布。对蒸有厚度匹配良好的双层膜的硅电池,测得的平均反射率低于5％。 提出了一个以测定太阳电池在蒸发减反射膜前后的短路电流来估算平均有效反射的方法。估算结果和测定值非常近似,可用于蒸膜工艺和对膜质量的鉴定。

Lower average reflectivity can be obtained using two antireflection coating instead of one,because the double layer system is a better "impedance match" between the high index of the semiconductor and the low index of air.Electron-beam evaporation was adopted to deposit tantalum oxide and silicon dioxide on the silicon solar cells because of their applicable index.The refractive index of Ta2O5 and SiO2 we obtained is 2.15 and 1.45 respectively.The transparency of Ta2O5 film from 0.3μm to 0.9 Mm spectrum and reflectivity between 0.4μm and 0.9μm spectrum interval were measured.The average reflectivity can be reduced to less than 5% when a suitable thickness of the double layer coating was deposited.A method was suggested to calculate the effective reflectivity average.By measuring the short circuit current before and after the performace of the coating.The results of the calculation and the direct measurement are neary identical.