摘要
现代集成电路制造业、数据存储工业和微机电系统等行业的不断发展,对纳米尺度线宽的测量提出了越来越高的要求.目前的一些测量方法分别存在各自的缺点与不足,在缺少更高准确度计量标准的情况下,往往采用比对的方法使计量结果趋于一致.国际计量局在1998年把纳米尺度线宽计量确定为纳米尺度基本特征国际关键比对项目之一.文章对它的主要研究内容以及进展情况作了介绍.
The advance in modern integrated circuits industry, data storage industry and micro\|mechanical engineering require more and more accurate measurement of nano\|scale linewidth. The present measuring methods have their respective disadvantage and drawback. Without higher level measurement criterion, the comparison method is always used to make different measurement results consistent. The nano\|linewidth was taken as one of nano\|scale basic feature international key comparison by BIPM at 1998. This article reviewed its main research content and progress.
出处
《中国计量学院学报》
2003年第3期165-169,173,共6页
Journal of China Jiliang University
