高电荷态ECR离子源——LECR3

High Charge State ECR Ion Source-LECR3

研制成功了一台新的高电荷态ECR离子源,该离子源主要为原子物理实验提供各种高电荷态离子束流,是基于中国科学院近代物理研究所14.5GHz高电荷态ECR离子源设计建成的,同时在该离子源中应用多种有利于提高束流强度的技术,设计时考虑到采用双频加热,试图通过试验双频加热模式来提高高电荷态离子的产额,并设计建造了一套束流聚焦分析系统,以提高电荷态分辨率和束流传输效率。

A new Electron Cyclotron Resonance (ECR) ion source, which was named LECR3 (Lanzhou Electron Cyclotron Resonance ion source no. 3) and expected to provide highly charged ion beams for atomic physics research, has been constructed and under commissioning. The design of this ion source is based on the IMP 14.5GHz ECR ion source, which was named LECR2 (Lanzhou Electron Cyclotron Resonance ion source no. 2) . In the new source it was desired with double RF heating by inserting waveguide directly and aluminum chamber. Furthermore, the volume of the plasma chamber is larger than that of LECR2 so as to increase the RF power and increase beam intensity for highly charged ions. But the hexapole field on the chamber wall is kept the same value in order to compare with the performance of LECR2 ion source. The results of this ion source are obviously better than LECR2. We obtained 780 euA of 06+ , 235euA of O7+ and 240euA of Ar11+ at 1100 watts of 14.5GHz RF power singly. Furthermore, in order to transmit the ion beams efficiently a new beam focusing and analyzing system was designed and constructed at the same time.