摘要
介绍了国内研究光学光刻波前工程的一些成果,如新型移相掩模、投影光刻的邻近效应和掩模加工的邻近效应的组合模拟等。
In this paper,the achievements in scientific research for the wave front of optical lithoyraphy in home are introduced.It includes The new ntase-shift mask and combined simulation for the optical prox-imity effects of projection optical lithography and mask processing.
出处
《电子工业专用设备》
2003年第5期50-52,共3页
Equipment for Electronic Products Manufacturing
