期刊文献+

薄膜均匀性的有限元算法 被引量:5

Simulating uniformity of film thickness with finite-elements method
下载PDF
导出
摘要 应用有限元方法模拟计算了镀膜系统平行平面转盘在不同转速以及不同的镀膜时间下波分复用(DWDM )系统介质滤光片的成膜均匀性。结果表明 ,针对不同的膜料 。 In this paper,finite elements method is used to simulate the film thickness uniformity at different rotation and different time. The result shows that the uniformity of film thickness can be improved if the rotation and time are selected properly.
出处 《激光技术》 CAS CSCD 北大核心 2003年第5期480-483,共4页 Laser Technology
关键词 薄膜 均匀性 有限元 转速 thin film uniformity finite elements rotation
  • 相关文献

参考文献2

二级参考文献1

  • 1H.K.普尔克尔 仲永安(译).玻璃镀膜[M].科学出版社,1988..

共引文献6

同被引文献67

  • 1范正修,薛松生,何朝玲.磁控溅射薄膜的厚度分布[J].应用科学学报,1993,11(2):136-140. 被引量:13
  • 2董磊,赵元安,易葵,邵建达,范正修.不同类型蒸发源对平面夹具薄膜均匀性的影响[J].强激光与粒子束,2005,17(10):1518-1522. 被引量:14
  • 3RK Waits. Planar magnetron sputtering [J]. J. Vac. Sci.Teehnol, 1978, 15:179-187.
  • 4Window B, Savvides N. Charged particle fluxes from planar magnetron sputtering sources [J]. J. Vac. Sci. Technol, 1986, 4:196-0:2.
  • 5Motohiro T. Applications of Monte Carlo simulation in the analysis of a sputter-deposition process [J]. J. Vac. Sci. Technol, 1986,4:189-195.
  • 6Billard Aet al. Attempted Modeling of Thickness and Chemical Heterogeneity in Coatings Prepared by DC Reactive Magnetron Sputtering [J].Surface and Coatings Technology, 1993,59:41-47.
  • 7Qi Hua Fan, Xiao Hong Chen, Computer simulation of film thickness distribution in symmetrical magnet magnetron sputtering [J]. Vacuum 1995,46(3):229.
  • 8Heister U, Krempel-Hesse J. Improving an advanced sputtering tool [J]. Vacuum 2000, 59:424-430.
  • 9Meng X Q, Fan X J, Guo H X. A new formula on the thickness of films deposited by planar and cylindrical magnetron sputtering [J]. Thin Solid Films, 1998, 335: 279-283.
  • 10Swann S.Film thickness distribution in magnetron sputtering [J]. Vacuum, 1998,38 : 791.

引证文献5

二级引证文献11

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部