摘要
报道了利用CVD方法研究GaN纳米线的成核和生长机理的最新结果 ,着重强调了生长温度和催化剂对纳米线生长的影响。通过分析GaN纳米线的形貌、显微结构与生长温度、催化剂等影响因素之间的依赖关系 ,详细研究了GaN纳米线的生长过程。这一结果有助于了解一维纳米结构的生长机理 ,实现纳米材料的可控制生长 。
GaN material is one of the most attractive semiconductor materials.It is reported that the latest research results in the nucleation and growth mechanism of the GaN nanowires,which is grown by CVD method.Emphasis was paid on the effect of growth temperature and catalyst.Through analysis of the morphologies,microstructures,and their dependence on the growth temperature and catalyst,a clear understanding on the growth of the GaN nanowires is figured out,which is the key for a controlled growth of high quality GaN nanowires and can be used for nanodevices.
出处
《北京大学学报(自然科学版)》
CAS
CSCD
北大核心
2003年第3期336-340,共5页
Acta Scientiarum Naturalium Universitatis Pekinensis
基金
国家自然科学基金 ( 5 0 0 2 5 2 0 6,1983 40 80 )
教育部"博士点专项基金"资助项目
关键词
GAN
成核
催化剂
生长机理
GaN
nucleation
catalyst
growth mechanism