摘要
The application of photoelectrochemical methods in the inhibition effects for copper corrosion was described. The methods include cyclic voltammetry photocurrent measurements, intensity modulated photocurrent spectrum(IMPS) and laser scanning photoelectrochemical microscopic method(PEM) which have been applied to the evaluation of inhibitors and inhibition behavior. The inhibition effect of BTA for copper corrosion is better than that of 4CBTA, 5CBTA, CBT 1, PTD, BT 250, CBTME and CBTBE at the same concentration. The inhibition mechanism of the derivatives of BTA with —COOH group(4CBTA, 5CBTA, CBT 1) is different from those with estergroup(CBTME, CBTBE).
The application of photoelectrochemical methods in the inhibition effects for copper corrosion was described. The methods include cyclic voltammetry photocurrent measurements, intensity modulated photocurrent spectrum(IMPS) and laser scanning photoelectrochemical microscopic method(PEM) which have been applied to the evaluation of inhibitors and inhibition behavior. The inhibition effect of BTA for copper corrosion is better than that of 4CBTA, 5CBTA, CBT 1, PTD, BT 250, CBTME and CBTBE at the same concentration. The inhibition mechanism of the derivatives of BTA with —COOH group(4CBTA, 5CBTA, CBT 1) is different from those with estergroup(CBTME, CBTBE).
出处
《中国有色金属学会会刊：英文版》
CSCD
2003年第5期1226-1230,共5页
Transactions of Nonferrous Metals Society of China
基金
Project (0 2QF14 0 2 2 )supportedbytheVenusprojectofShanghai,project(01I01)supportedbyScienceandTechnologyFoundationofShanghaiEducationBureauofChinaandprojectsupportedbytheKeyDisciplineofShanghaiEducationBureauofChina
关键词
铜腐蚀
抑制剂
光电化学
光电流测量
BTA
copper
corrosion
inhibitors
inhibition mechanism
photoelectrochemical method
