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微加工中的聚焦离子束直接写入技术 被引量:1

Direct writing techniques in microfabrication using focused ion beams
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摘要 概述了聚焦离子束直接写入、离子研磨、离子注入及离子沉积技术。介绍了利用聚焦离子束技术在镀金硅片上研磨出的图案及制作出的各种纳米结构。聚焦离子束诱导沉积技术为将在各种科学工程领域应用的多种微结构的实现提供了可能,如聚焦离子束真空封装技术,它可被用来真空封装MEMS器件。 An overview of the FIB direct write technique,applications in milling,implantation,and deposition is given.An experiment of milling patterns on top of a gold-coated silicon wafer is carried out to study the FIB milling behavior.FIB has shown to be successful in fabricating a number of nanostructures.FIB-induced deposition shows the realization of a number of microstruc-tures that will find applications in various fields of science and engineering.A good example is the FIB-deposited vacuum encapsulations that can be used for vacuum sealing of MEMS devices.
出处 《微纳电子技术》 CAS 2003年第11期1-8,共8页 Micronanoelectronic Technology
基金 美国国家科学基金支持项目(DMI-0002466 CMS-0115828)
关键词 微加工 聚焦离子束 直接写入 蚀刻 微结构 半导体 deposition direct writing etching FIB implantation microfabrication
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参考文献11

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同被引文献9

  • 1马向国,顾文琪.聚焦离子束加工技术及其应用[J].微纳电子技术,2005,42(12):575-577. 被引量:9
  • 2许兴胜,熊志刚,金爱子,陈弘达,张道中.聚焦离子束研制半导体材料光子晶体[J].物理学报,2007,56(2):916-921. 被引量:8
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