软刻蚀技术及其应用

Soft lithography technology and applications

软刻蚀是通过表面带图案的弹性模板来实现图案的转移的图形复制技术,作为非光刻微米和纳米量级微加工方法,加工的分辨率可以达到5nm100μm,它克服了传统光刻技术的缺陷,为形成和制作平面和曲面上的微米和纳米图案提供了简便、有效的低成本途径。本文将主要介绍微接触印刷、近场光刻蚀、纳米压印等软刻蚀方法的原理、方法以及面临的问题,并简介了它们在微米和纳米加工、微电子学、材料科学、光学、微电子机械系统、表面化学等方面应用。

Soft lithography represents a patterns replicable strategy based on an elastic stamp/mold with surface patterned relief structures for transferring patterns. As a non-photolithographic technique for carrying out nano- and micro-fabrication, soft lithography can generate patterns and structures with feature sizes ranging from 5 nm to 100μm. It overcomes difficulties that the traditional photolithography encounters and provides a convenient, effective, low-cost method for the formation and manufacturing of micro- and nano-structures on planar or non-planar substrates. We discuss the principles of three primary techniques (microcontact printing (μCP), near-field photolithography(NFP), nano-imprinting lithography (NIL)), their procedures and problems they face, and introduce their applications in micro- and nano-fabrication, microelectronics, materials science, optics, MEMS, and surface chemistry.