CeO_2掺杂TiO_2催化剂薄膜的制备与表征

Preparation and Characterization of CeO_2-doped TiO_2 Catalytic Thin Films

以 Ar为工作气体 ,O2 为反应气体 ,利用射频磁控溅射技术成功地在载玻片上沉积了透明 Ti O2 催化剂薄膜。同时利用共溅射技术制备了掺杂 Ce O2 的 Ti O2 催化剂薄膜。采用 X射线衍射 (XRD)、Raman光谱、UV- VIS- NIR分光光度计、原子力显微镜 (AFM)

Transparent TiO_2 thin films have been successfully deposited onto microscope glass slides by radio frequency magnetron sputtering using Ar and O_2 as the working and reactive gases, respectively.Then CeO_2-doped TiO_2 catalytic thin films were prepared by the co-sputtering method.The films were characterized using X-ray diffraction, Raman spectroscopy, UV-VIS-NIR spectrophotometer and atom force microscope technologies.