PZT铁电薄膜刻蚀的研究进展

Advances of PZT Ferroelectric Thin Films in Etching Techniques

PZT铁电薄膜器件在微电子领域有着广泛的应用,可用于制备微机械系统(MEMS)、DRAM、红外探测器等,而薄膜的微图形化刻蚀技术是制备工艺中重要的环节。该文主要介绍了PZT铁电薄膜刻蚀技术的研究进展和应用,并对各种刻蚀法进行分析和对比。

PZT thin films have many important applications in microelectronic fields. They can be used to make some advices, such as MEMS, DRAM, infrared devices et al. The etching techniques and micropattern of PZT thin films are very important to the preparation of devices. This article chiefly introduces some etching techniques of PZT thin films and the related results, gives some comparisons about these methods.