期刊文献+

凝结核对DLA的分形维影响 被引量:1

The DLA Fractal Dimensions for Different Aggregation Kernels
下载PDF
导出
摘要 本文推广了经典DLA模型.经典DLA模型的凝结核是一个点,本文将凝结核扩充为正方形、圆、线段等情形,得到了相应的分支结构图及盒维数.结果表明分支结构图是不同的,但分形维是相近的。 In the classical DLA model[1] the aggregation kernel is a single point and the corresponding dimension is 1.66. The problem is, when the kernel is changed, how the dimension changes. This paper answers the question. When the kernel is changed to circle, square or line there are corresponding figures and dimensions. The result shows that DLA figures are different and the dimensions are sindlar.
出处 《大连大学学报》 1999年第2期27-29,共3页 Journal of Dalian University
关键词 凝结核 DLA模型 扩散限制凝聚模型 分形 DLA (diffusion limited aggregation), fractal dimension, aggregation kernel, box dimension
  • 相关文献

同被引文献13

  • 1吴建章,徐昌业.DLA模型与分形生长研究综述[J].山东工业大学学报,1996,26(A09):403-410. 被引量:9
  • 2Vincent Fleury. Branched Fractal patterns in non-equilibrium electrochemical deposition from oscillatory nucleation and growth[J]. Nature,1997,390(6656):145~147.
  • 3Bradley J C, Chen H M. Creating electrical contacts between metal particles using directed using directed electrochemical growth[J]. Nature, 1997,389(6648):268~270.
  • 4Tadeusz Hepel. Effect of Surface Diffusion in Electrodeposition of Fractal Structures[J]. J. Electrochemical Science and Technology. 2487(134):2685~2690.
  • 5Matsushita M, Sano M. Fractal Structures of Zinc Metal Leaves Grown by Electrodeposition[J]. Phys. Rev. Lett, 1984,53(3):286~289.
  • 6Brady R M, Ball R C. Fractal growth of copper electrodeposits[J]. Nature, 1984,309(5):225~229.
  • 7Grier D, Ben-Jacob E. Morphology and Microstructure in Electrochemical Deposition of Zinc[J]. Phys. Rev. Lett. 1986,56(12):1264~1267.
  • 8CHEN Chao-Peng, Jorne Jacob. Fractal Analysis of Zinc Electrodeposition[J]. J. Electrochem. Soc., 1990,137(7):2047~2051.
  • 9Hibbert D B, Melrose J R. Copper electrodeposits in paper support[J]. Phys. Rev. A, 1988,38(2):1036~1048.
  • 10Laszlo Balazs. Fractal Growth of Silicon-rich domains during annealing of aluminum thin films deposited on silica[J]. Phys. Rev. E, 1996, 54(1):599~604.

引证文献1

二级引证文献11

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部