摘要
简述了IBAD(离子束辅助沉积)法制备纳米钛膜的过程中,关键工艺因素是如何将衬底温度维持在一个适当的范围,并运用PID(比例积分微分)调节器较好地实现这一要求的。
In the preparation process of nanometer TiB 2 film by IBAD(ion beam assisted depo-sition)method,key technical factor is how to retain the substrate temperature at a proper range.The request can be realized well by using PID controller.
出处
《微纳电子技术》
CAS
2003年第12期22-23,46,共3页
Micronanoelectronic Technology