金刚石薄膜的低温沉积

Deposition of diamond films at low substrate temperature

采用乙醇和氢气作为工作气体,利用微波等离子体化学气相沉积法在较低的沉积温度下制备了金刚石薄膜,用扫描电子显微镜(SEM)、Raman光谱、X射线衍射仪(XRD)和红外光谱研究了薄膜的结构和性质.结果表明:在450℃的基片温度下,利用乙醇和氢气在优化的工艺条件下可得到具有微晶结构的金刚石薄膜.

Diamond films have been prepared from ethanol and hydrogen using microwave plasma chemical vapor deposition at a lower substrate temperature. The structure and quality of the films have been investigated by scanning electron microscopy (SEM), Raman spectroscopy, Xray diffraction(XRD)and infrared(IR)spectroscopy. The results show that diamond film with microcrystalline grains cam be deposited under optimization conditions at substrate temperature of 450 ℃.