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氮氧混合气体对沉积金刚石膜的影响

Influence of oxygen and nitrogen mixtures addition on deposited diamond film
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摘要 通过对微波等离子体化学气相沉积装置中沉积的金刚石薄膜形貌与质量的检测研究了向甲烷/氢气等离子体中同时添加氮气/氧气对薄膜沉积的影响,获得了包括微米级和纳米级的多种薄膜;采用扫描电子显微镜、拉曼光谱以及X射线扫描对薄膜进行了表征,结果表明:只引入少量氧气后生成了<111>取向的较大粒度金刚石薄膜,而只引入少量氮气时生成了<110>取向的纳米级金刚石薄膜;当引入总量一定的氮氧混合气体时,根据氮气与氧气的引入量,所获得的薄膜从微米级多晶金刚石膜延伸至纳米级金刚石薄膜,其晶面组成从混合<111>与<110>取向过渡到<100>取向再过渡到<110>取向,氧气浓度较高时样品表现为大粒度成膜,随氮气浓度增加晶粒迅速减小,氮气浓度较高时所得样品则是标准的纳米膜;氮气和氧气的引入明显地影响着薄膜的不同粒径、不同微观结构和形貌的改变,表明通过调整气体引入量可以指向性获得具有特定微观结构的薄膜. the influence of oxygen and nitrogen addition in standard methane / hygrogen plasma on the films deposition was investigated by the morphology and texture test in a microwave plasma chemical vapor deposition reactor, and the films ranging from microscale to nanoscale was got. Scanning electron microscope, Raman spectroscopy and X ray diffraction were used to detect the surface morphology and the quality of the films. The results show that only small amount of oxygen addition favors the formation of a <111 > texture large-grained polycrystalline diamond film, while just nitrogen addition leads to a <110 > facet fine-grained nanocrystalline diamond film. By adding a fixed amount of oxygen and nitrogen mixtures, diamond films show different morphologies ranging from both <111 > and <110 > texture to <100 > then to just <110 > texture,which was decided by the ratio of oxygen and nitrogen; samples in higher oxygen concentration were largegrained, but when nitrogen increased, they shrank quickly, finally became fine-grained nanocrystalline in high nitrogen concentration. The results indicate that the addition of nitrogen and oxygen affects the microstructure, morphology and texture of the films, which means that the designated microstructures of diamond films are got by adjusting the gas addition.
出处 《武汉工程大学学报》 CAS 2015年第2期30-35,共6页 Journal of Wuhan Institute of Technology
基金 国家自然科学基金项目(11175137)
关键词 微波等离子体化学气相沉积法 氮氧引入 金刚石膜 microwave plasma chemical vapor deposition nitrogen and oxygen addition diamond film
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参考文献15

  • 1Z. Yiming,F. Larsson,K. Larsson.Effect of CVD diamond growth by doping with nitrogen[J]. Theoretical Chemistry Accounts . 2014 (2)
  • 2Qingkai Zeng,Linjun Wang,Lingyun Shi,Kaifeng Qin,Jian Huang,Ke Tang,Jiahua Min,Weimin Shi,Yiben Xia.Optimizing hydrogen plasma etching process of preferred (110)-textured diamond film[J]. Surface & Coatings Technology . 2013
  • 3C.J. Tang,A.J.S. Fernandes,X.F. Jiang,J.L. Pinto.Simultaneous formation of nanocrystalline and <100> textured and {111} facet dominated microcrystalline diamond films using CH 4 /H 2 /O 2 plasma[J]. Diamond & Related Materials . 2011
  • 4C.J. Tang,A.J.S. Fernandes,F. Costa,J.L. Pinto.Effect of microwave power and nitrogen addition on the formation of {100} faceted diamond from microcrystalline to nanocrystalline[J]. Vacuum . 2011 (12)
  • 5J. Achard,F. Silva,O. Brinza,A. Tallaire,A. Gicquel.Coupled effect of nitrogen addition and surface temperature on the morphology and the kinetics of thick CVD diamond single crystals[J]. Diamond & Related Materials . 2006 (4)
  • 6K. Subramanian,W.P. Kang,J.L. Davidson,W.H. Hofmeister,B.K. Choi,M. Howell.Nanodiamond planar lateral field emission diode[J]. Diamond & Related Materials . 2005 (11)
  • 7C.J. Tang,A.J. Neves,M.C. Carmo.On the two-phonon absorption of CVD diamond films[J]. Diamond & Related Materials . 2005 (11)
  • 8I.-H Choi,P Weisbecker,S Barrat,E Bauer-Grosse.Growth of highly oriented diamond films by the MPCVD technique using CO–H 2 , CH 4 –H 2 and CH 4 –N 2 –H 2 gas mixtures[J]. Diamond & Related Materials . 2003 (4)
  • 9Influence of oxygen and nitrogen on the growth of hot-filament chemical vapor deposited diamond films[J]. Thin Solid Films . 1999 (1)
  • 10P. Hartmann,S. Bohr,R. Haubner,B. Lux,P. Wurzinger,M. Griesser,A. Bergmaier,G. Dollinger,H. Sternschulte,R. Sauer.Diamond growth with boron addition[J]. International Journal of Refractory Metals and Hard Materials . 1998 (3)

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