期刊文献+

合金钢氮化与氮化物沉淀动力学的元胞自动机模拟研究 被引量:1

Cellular Automaton Modeling of Nitridation and Nitride Precipitation in Alloy Steels
下载PDF
导出
摘要 应用元胞自动机模型对合金钢表面氮化及扩散层中氮化物沉淀过程进行了计算机模拟。考察了过程的动力学和沉淀相尺寸与分布特征 ,以及氮势和稳定氮化物形成元素含量对它们的影响。结果表明氮化过程动力学为抛物线型 ,抛物线速率常数k随氮势提高呈线性增大 ;氮化物形成元素含量XM 对氮化速率也有影响 ,k~XM 基本呈线性正比关系 ; Simulations of surface nitridation and nitride precipitation in alloy steels have beeb carried out with cellular automaton modeling.Process kinetics and size and distribtuion of precipitates,and their dependence on nitrogen potential and concentration of nitride-forming elements,are investigated.The results show a parabolic kinetics,with the parabolic rate constant linearly increasing with nitrogen potential and the concentration of stable-nitride-forming element of the alloy.The simulation further showed that the fraction and particle size of stable nitride precipitates in the surface layers increase with lowering of nitrogen potential.
出处 《材料科学与工程学报》 CAS CSCD 北大核心 2003年第6期879-881,共3页 Journal of Materials Science and Engineering
基金 国家自然科学基金资助项目 (5970 1 0 2 )
关键词 元胞自动机 CA 合金钢 动力学 氮化过程 nitridation precipitation cellular automaton computer simulation
  • 相关文献

参考文献1

二级参考文献1

共引文献16

同被引文献19

  • 1DierkRaabe[德] 项金钟 吴兴惠译.计算材料学[M].北京:化学工业出版社,2002..
  • 2FrenkelSmit[荷] 汪文川等译.分子模拟[M].北京:化学工业出版社,2002..
  • 3A Esteve, M D Rouhani, Ph Faurous. Modeling of the silicon(100) thermal oxidation:from quantum to macroscopic formulation [J]. Materials Science in Semicondoctor Processing,2000, 3: 47.?A
  • 4A Esteve, M D Rouhani, D Esteve. Modeling methodology of silicon oxidation from quantum calculation to Monte Carlo level[J]. Microelectronics Reliability, 1999, 39: 275.?A
  • 5T Uchiyama, T Uda, K Terakuru. Initial oxide - growth process on Si(100) surface[J]. Surface Science, 1999, 433 ~435:896.?A
  • 6V Isabella Pazzi, P H T Philipsen, E J Baerends et al. Oxygen adsorption on Ag (110): density functional theory band structure calculation and dynamical simulations[J ]. Surface Science,1999,443(1) :1.?A
  • 7T Sasaki, T Ohno. Adsorption of the oxygen to the Al (111)surface[J]. Computational Materials Science, 1999,14: 8.?A
  • 8R K Kalia, T J Cambell, A Chatterjee et al. Multiresolution algorithms for massively parallel molecular dynamics simulations of nanostructured materials[J ]. Computer Physics Communications, 2000,128:245.?A
  • 9R Chakarova, D E Oner, I Zoric et al. Monte Carlo simulation of initial Al(111) oxidation[J]. Surface Science, 2001, 472:63
  • 10P Y Hou. Beyond the Sulfur Effect[J]. Oxidation of Metals,1999, 52(3) :337.?A

引证文献1

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部