半导体生产排放的废气和废水中砷、磷、硫的分析方法研究

Analytical Method of As、P and S in the Waste Gases and Water Emitted from Semiconductor Process

研究了一种快速、灵敏、可靠的高温氢还原 -气相色谱分析方法 [1 - 2 ] ,,并自行设计了高温还原系统 (还原炉、六通阀等 ) ,测定半导体生产排放废气和废水中的砷、磷、硫及其化合物 ,样品不需预处理 ,使气相色谱仪能直接测定固、液、气相样品中砷、磷、硫及其化合物的含量。砷、磷、硫的检测限分别为 0 .0 1 mg/ L、0 .0 0 3mg/ L、0 .0 2 mg/ L ;相对标准偏差分别为 6.2 %、8.6%和 0 .3% ,与经典方法进行对比 ,结果基本一致。从分析方法的误差统计角度 ,也说明该方法准确、可靠。

A convenient、sensitive、reliable method,high-temperature hydrogen reduction gas chromatography,was mainly investigated in this paper.And the high-temperature hydrogen reduction system was designed out independently including reduction furnace and six-way valve.It was convenient to determine directly the contents of arsenic、phosphorus、sulfur and their compounds in solid、liquid、gaseous phase samples by high-temperature hydrogen reduction gas chromatography for samples needn't be treated in advance.The lower limit of detection for arsenic、phosphorus and sulfur by this method were 0.01mg/L、0.003mg/L、 0.02mg/L,respectively,and their relative standard deviations were 6.2%、8.6% and 0.3%,respectively.Results from gas chromatography were primarily accordant to those of conventional methods such as colorimetry and ion-chromatography.The error statistics of analysis methods also showed that this method was accurate and reliable.