载荷、相对湿度和气氛对硅表面及金表面纳米摩擦特性的影响

Effect of Load,Relative Humidity and Controlled Atmosphere on Nanofrictional Properties of Silicon and Au Surfaces

利用分子沉积技术 ,在不同修饰的硅表面上考察了载荷对纳米摩擦学性能的影响 ,同时在阴、阳离子化金表面上考察了湿度、气氛对纳米摩擦学性能的影响。结果表明 ,不同修饰的硅表面在较低的载荷下 ,摩擦力均随着载荷成线性增加 ,同时发现单层磺化酞菁铜MD膜修饰的硅表面没有改变硅的摩擦特性 ;试验表明 ,在阳离子化金表面上 ,相对湿度越大 ,摩擦力和摩擦系数越低 ;阴离子化金表面在氮气保护下 ,体系的摩擦学特性不同于大气环境。

In this paper,effect of load on nanofrictional properties is studied on different Silicon surface by atomic force microscopy using molecular deposition(MD) technology. At the same time,the same studies are carriedout on cationic Au surface,whose terminal is N(CH 3 ) 2 H + ,and anionicAu surface,whose terminal is SO 3- ,in different relative humidityand controlled atmosphere. The results show that frictional force increases with load in direct proportion on different Silicon surface. But to Silicon surface deposited monolayer copper phthaloc-yaninetetrasulfonic acid,tetrasodium salt (CuTsPc) molecular deposition film,nanofrictional properties do not change. For cationic Au surface and anionicAu surface,the higher relative humidity,the lower frictional force and frictional coefficient. Additionally,nanofrictional properties for the system in controlled atmosphere aredifferent from that in air environment.