摘要
介绍了不同加工方式对铬靶烧结密度的影响。在机压过程中,采用双向压制,不添任何成型剂和脱氧剂。机压+真空烧结铬环靶材密度为78%～80%;冷等静压+真空烧结铬板靶材密度大于82%;而经轧制后,铬板靶材密度提高到90%～95%;铬合金靶材采用热压方式,其密度大于98%。通过优化烧结时间和烧结温度等工艺参数,铬环靶材的烧结成本大大降低。
In this paper, the influences of different processes on sintering density of Cr-target are studied. The density of ring Cr-target after pressing and vacuum sinter is 78%～80%; the density of plane Cr-target after cold isostatic pressing and vacuum sinter exceeds 82%. While the density of plane Cr-target after rolling is increased to 90%～95%; the density of chrome alloy target after hot pressing exceeds 98%. Through optimizing the process parameters including sintering time and sintering temperatures, the sintering costs of ring Cr-target are decreased greatly.
出处
《金属成形工艺》
2003年第6期83-85,共3页
Metal Forming Technology
关键词
粉末冶金
高纯铬
铬合金
溅射靶材
烧结工艺
chrome
chrome alloy
powder metallurgy
sputtering target material
