微波ECR等离子体溅射沉积T_t薄膜的结构研究

THE STRUCTURAL STUDY OF TI FILMS DEPOSITED BY MICROWAVE ECR PLASMA SPUTTERING METHOD

用电子回旋共振(ECR)等离子体溅射方法在室温基片上沉积出的T_i薄膜的结构是用X RD和TEM进行分析的。结果表明所沉积的T_i薄膜是平均粒径,晶粒尺寸分布很窄的稳定fcc结构。在实验过程中发现可以通过对工作参数的调整控制薄膜的晶粒尺寸。我们还讨论了ECR等离子体对薄膜结构和晶粒尺寸的影响。

The structure of Ti films deposited at room temperature by microwave ECR plasma sputtering method has been determined by XRD and TEM. The Ti films that consist of nanocrystal particles with <10nm in grain size, narrow distribution are stable fcc structure. It is found that the grain size can be controled by adjusting the working parameter in the experiments. Is this paper, the influences of ECR plasma on structure and the grain size of the films have been discussed.