集成电路薄膜工艺的新进展——化学液相淀积
Chemical Liquid Phase Deposition:A New Development in Manufacturing Technology for Thin Films Used in Integrated Circuits
摘要
介绍了化学液相淀积法制备氧化物薄膜的工艺过程及其在集成电路生产中的应用,并报道了一些最新研究成果。
The process of manufacturing thin oxide films by chemical liquid phase deposition and its application in integrated circuits industry is discussed. Some novel research results are also reported-
出处
《材料导报》
EI
CAS
CSCD
2003年第10期78-79,共2页
Materials Reports
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