两性离子聚合物硅垢阻垢剂的合成及阻垢性能

Synthesis and Scale Inhibition Performance of Amphoteric Polymer Silicon Scale Inhibitor

采用水溶液自由基聚合法,引入一种新型烯丙基型季铵盐阳离子——三羟乙基烯丙基季铵盐,与丙烯酰胺、2-丙烯酰胺-2-甲基丙磺酸(AMPS)在氧化-还原引发剂体系下合成一种两性三元共聚物。在静态条件下考察最佳合成条件:单体配比n(季铵盐阳离子)∶n(丙烯酰胺)∶n(AMPS)为1∶2∶1,聚合温度为60℃、反应时间为4 h、引发剂质量分数为4. 5%时,合成的聚合物阻垢性能最好。性能评价结果表明,阻垢剂质量浓度为120 mg/L时,对硅垢的阻垢率可达到78. 2%。通过加入阻垢剂前后垢样的电镜扫描图可知,加入阻垢剂的垢样疏松分散。

A new type of allyl quaternary ammonium salt,three hydroxyethyl allyl quaternary ammonium salt is introduced. An amphoteric terpolymer was synthesized by free radical polymerization in aqueous solution with trihydroxyethyl allyl quaternary ammonium salt,acrylamide and 2-acrylamide-2-methylpropionic sulfonic acid( AMPS) under redox initiator. The best synthetic conditions are studied under static conditions. The results show that when monomer ratio n( quaternary ammonium salt cationic) ∶ n( acrylamide) ∶ n( AMPS) is1∶ 2∶ 1,the polymerization temperature is 60 ℃,the reaction time is 4 h and the mass fraction of initiator is 4. 5%,the synthesized polymer has the best scale inhibition performance. The performance evaluation results of the inhibitor shows that when the mass concentration of the scale inhibitor is 120 mg/L,the inhibition rate of it to silicon scale could reach to 78. 2%. Scanning electron microscopy of scale samples before and after adding the scale inhibitor shows that the scale samples with scale inhibitor are loose and dispersed.