阴离子印迹技术研究进展

Research progress in anion imprinting technology

离子印迹技术因具有高效的预定性、专一的识别性和广泛的适用性,近年来已用于有毒阴离子的检测、分离及吸附去除。通过梳理离子印迹技术的基本原理、制备方法及其在含毒性阴离子废水处理中的优势,针对典型毒性阴离子(砷、铬、钼、氰化物、硫氰化物、三氯乙酸)印迹复合材料及其应用进行了简述,并对阴离子印迹技术存在的问题和发展进行了分析与展望。

Ion imprinting technology(IIT)can create three-dimensional cavity structures in a polymer matrix,i.e.,ion imprinting polymers by the copolymerization of functional monomers and cross-linkers in the presence of target ion that act as template molecules based on coordination or electrostatic interactions.After removing the template ion with acidic reagent,recognition cavities complementary to the template ion are formed in the highly cross-linked polymer matrix.Owing to the predetermination,specific recognition and applicability,IIT has been applied to the detection,separation and adsorption removal of toxic anions.The principles and synthesis strategies of IIT,and its advantages in wastewater treatment are introduced in the review.Then,the applications of ion imprinted polymers for typical toxic anions including arsenic,chromium,molybdenum,cyanide,thiocyanide and trichloroacetate ions are summarized.Finally,some problems and future trends about IIT for toxic anions are also discussed and prospected.