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摩擦取向膜表面液晶薄层厚度的研究

Thickness Evaluation of Surface Rubbed Liquid Crystal Film Grown on Silicon Substrate
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摘要 基于液晶具有光学单轴晶体的性质 ,结合阿贝折射仪测出了方位折射率 ,利用反射椭偏消光法测量原理解决了在多层介质膜上液晶吸附层厚度测量问题。利用这种方法测量了经过摩擦取向处理的高分子取向膜表面的液晶薄层厚度。实验发现 ,经过不同摩擦强度处理后的取向膜吸附液晶薄层的厚度为 5 4nm± 3nm。 Experimental techniques, with a combination of ellipsometry and Abbe refractometery, were discussed to improve the precision in thickness evaluation of the surface rubbed liquid crystal film grown on silicon substrate. The thickness of the liquid crystal films, the surfaces of which was rubbed with different rubbing strengths, was measured in this technique. The results show that the thickness, 54 nm ± 3 nm, is almost independent of rubbing strength.
出处 《真空科学与技术》 EI CSCD 北大核心 2003年第6期382-384,共3页 Vacuum Science and Technology
基金 国家自然科学基金资助项目(199740 46 5 9973 0 2 0 60 2 770 3 3) 吉林省科委基金资助项目 (2 0 0 10 5 79) 中国科学院百人计划资助项目(19990 3 5 9)
关键词 液晶 摩擦强度 阿贝折射仪 方位折射率 反射椭偏消光法 取向膜 界面效应 薄层厚度 Crystal growth Ellipsometry Evaluation Silicon Thickness measurement
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参考文献4

  • 1[1]Xuan Li,Wu Rina,Peng Zenghui et al.Order parameters of liquid crystal on the rubbing surfaces of alignment layers[J].Science in China E,2002,45(6):654~660
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  • 3[3]Uchida T,Hirano M,Sakai H.Director orientation of ferroelectric liquid crystal in substrates with rubbing treatment the effect of surface anvhoring strength[J].Liq Cryst,1989,5(4):1127~1137
  • 4[4]Sato Y,Sato K,Uchida T.Relationship between rubbing strength and surface anchoring of nematic liquid crystal[J].Jpn J Appl Phys,1992,31:L579~L581

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