期刊文献+

氧化石墨烯在水合肼中对单晶硅织构化的影响 被引量:1

The Effect of Graphene Oxide on Monocrystalline Silicon Texture in Hydrazine Hydrate
下载PDF
导出
摘要 单晶硅太阳能电池的表面反射率是影响其光电转换效率的重要因素之一,表面织构化对降低表面反射率有着重要作用。采用水合肼对单晶硅进行刻蚀,并采用不同氧化程度的氧化石墨烯作为碳催化剂对水合肼腐蚀体系进行催化,采用失重法、XRD、SEM和FTIR测试手段对反应产物进行表征。结果表明:氧化石墨烯的加入对水合肼体系起到了促进催化的效果,质量浓度为1 mg/m L的氧化石墨烯促进效果最好,单晶硅表面金字塔形貌最佳;不同还原态的氧化石墨烯促进效果不同,还原时间最短时表面金字塔形貌最佳;随着还原程度的增加,促进作用越来越小,当还原时间为7 h时,水合肼的各向异性消失,表现出各向同性的特性。 The surface reflectivity of monocrystalline silicon solar battery is one of the important factors of effect on photoelectric conversion efficiency. It is important for texturing monocrystalline to improve photo-electric conversion efficiency. We firstly adopt hydrazine hydrate as etching agent and graphene oxide with different oxidation degree were added into hydrazine hydrate to catalyze the corrosion. Products were char-acterized by XRD,SEM,FTIR and weight loss method. The results indicate that graphene oxide facili-tates the corrosion of monocrystalline silicon. And the optimal concentration is 1 mg / mL at that concentra-tion pyramid structures is fine. Moreover,the reduction time has an effect on the corrosion results. The less the reduction time is,the great effects of facilitating the corrosion is. When the reduction time is 7 h, the anisotropy disappears and turns into isotropy of hydrazine hydrate.
出处 《西南科技大学学报》 CAS 2016年第1期1-4,共4页 Journal of Southwest University of Science and Technology
基金 四川省非金属复合与功能材料重点实验室-省部共建国家重点实验室培育基地开放基金项目(13ZXFK08)
关键词 氧化石墨烯 水合肼 单晶硅织构化 Graphene oxide Hydrazine hydrate Monocrystalline silicon texturing
  • 相关文献

参考文献9

  • 1Seidel H,Csepreyi L,Heuberger A,et al.Anisotropic etching of crystalline silicon in alkaline solutions, I Orientation dependence and behavior of passivation layers. Journal of the Electrochemical Society . 1990
  • 2Dreyer, Daniel R.,Murali, Shanthi,Zhu, Yanwu,Ruoff, Rodney S.,Bielawski, Christopher W.Reduction of graphite oxide using alcohols. Journal of Materials . 2011
  • 3Graphene Oxide: A Convenient Carbocatalyst for Facilitating Oxidation and Hydration Reactions(J)Angewandte Chemie . 2010 (38)
  • 4王峥,任毅.我国太阳能资源的利用现状与产业发展[J].资源与产业,2010,12(2):89-92. 被引量:82
  • 5Smith A W,Rohatgi A.Ray Tracing Analysis of theInverted Pyramid Texturing Geometry for High EfficiencySilicon Solar Cells. Solar Energy Materials . 1993
  • 6Pierre Verlinden,Olivier Evrard,Emmanuel Mazy,AndreCrahay.The surface texturization of solar cells:A new method using V2grooves with controllable side-wall angles. Solar Energy Materials . 1992
  • 7田嘉彤,冯仕猛,王坤霞,徐华天,刘峰,黄建华,杨树泉,裴俊.单晶硅表面金字塔生长过程的实验研究[J].光子学报,2011,40(10):1505-1508. 被引量:8
  • 8J. Zhang,X. Liu,R. Blume, et al.Surface-modified carbon nanotubes catalyze oxidativedehydrogenation of n-butane. Science . 2008
  • 9Seidel, H.,Csepregi, L.,Heuberger, A.,Baumgaertel, H.Anisotropic etching of crystalline silicon in alkaline solutions. II. Influence of dopants. Journal of the Electrochemical Society . 1990

二级参考文献25

  • 1王敦清,秦守勤,巫文勇.我国可再生能源发展的制度建构[J].江西师范大学学报(哲学社会科学版),2006,39(6):15-19. 被引量:5
  • 2魏光普.太阳能与阳光经济[J].上海电力,2006,19(4):337-342. 被引量:10
  • 3徐海荣,钟史明.充分利用我国太阳能资源,开发太阳能光伏产业[J].沈阳工程学院学报(自然科学版),2006,2(4):299-302. 被引量:20
  • 4沈飞,梁雪春.大力支持太阳能产业的可行性分析[J].生态经济,2006,22(11):105-107. 被引量:14
  • 5徐泽玮.关于我国发展太阳能发电技术产业的思考[J].电源技术应用,2006,9(12):1-7. 被引量:12
  • 6KIM J, KIM Y. The enhancement of homogeneity in the textured structure of silicon crystal by using ultrasonic wave in the caustic etching process[J]. Solar Energy Materials and Solar Cells,2004,81(2) : 239 247.
  • 7VALLEJO B, GONZAI.EZ MANAS M, MARTINEZ I.OPEZ J,et al. On the texturization of monocrystalline silicon with sodium carbonate solutions[J]. Solar Energy, 2007,81 (5) : 565-569.
  • 8XI Zhen-qiang, YANG De-ren, DAN Wu, et al. Investigation of texturization for monorystalline silicon solar cells with different kinds of alkaline [J]. Renewable Energy, 2004, 29 (13), 2101-2107.
  • 9SINGH PK, KUMAR R, LAL M, et al. Effectiveness of anisotropic etching of silicon in aqueous alkaline solutions [J]. Solar Energy Materials and Solar Cells, 2001,70 ( 1 ) : 103- 113.
  • 10SUNDARAM K B, VIJAYAKUMAR A, SUBRAMANIAN G, et al. Smooth etching of silicon using TMAH andisopropylalcohol for Microelectronic Engineering, MEMS applications [ J]. 2005,77(3-4) : 230-241.

共引文献88

同被引文献7

引证文献1

二级引证文献4

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部