氮化碳薄膜的制备及研究现状

Synthesis and Study Status of Carbon Nitride Thin Film

氮化碳具有良好的物理、化学性质和广泛的应用前景。目前主要采用化学气相沉积法、离子束溅射法、激光等离子体沉积和激光烧蚀、离子镀、离子注入法等制备方法。文中对氮化碳的结构、性质、制备、性能表征以及研究现状进行了比较详细的介绍。

Carbon nitride comprises super physical and chemical properties and broad applications. Its structure and character were reviewed, and the synthetic methods, including CVD, ion beam sputtering, laser ablation, ion plating and ion irradiation et al., were completely introduced. The perspectives of the investigations of the super-hard carbon nitride were discussed by looking at the new progresses achieved in the corresponding application studies. The experimental results show that the crystallites of a little cubic C-N compound disperse in an amorphous matrix. FTIR spectroscopy shows that the films contain mainly C=C and sp2/sp3 C-C bonds. X-ray diffraction and SEM studies indicate that the deposited films may consist of the nano-sized β-C3N4. Crystallites embedded in matrix of graphite form of C3N4 structure, and the crystalline phases are high enough to be detected by XRD.