期刊文献+

基于几何模型的表面微加工MEMS工艺层模型生成 被引量:3

Generating Layered Model from Geometric Model for Surface Micro-Machined MEMS
下载PDF
导出
摘要 现有微机电系统设计中所存在的一个重要问题是,设计人员需要通过工艺和版图设计来完成几何设计,因此难以用于复杂器件的设计。研究了表面微加工MEMS几何模型到工艺层模型的自动转化,旨在实现MEMS器件几何设计和工艺规划的分离,给出了表面微机械加工的工艺特征的定义和分类方法,并简要介绍了工艺特征的自动识别过程,重点研究了基于工艺特征模型的工艺层模型自动生成方法。最后给出了试验结果。 One problem with traditional MEMS design methodology is that it is not a structured method. In this paper, a method for automatically generating the layered model from its geometric model is proposed as the basis of the structured MEMS design. The method is mainly composed of two parts: definition and automated recognition of the process features for surface micro-machined MEMS; automated generation of the layered model based on the recognized process features. The method aims at enabling designers to concentrate on the creative design activity without considering the tedious fabrication process.
出处 《计算机集成制造系统-CIMS》 EI CSCD 北大核心 2003年第12期1126-1131,共6页
基金 国家863/CIMS主题资助项目(2001AA411310) 教育部跨世纪优秀人才培养计划资助项目。~~
关键词 微机电系统 几何模型 表面微加工 MEMS 工艺层模型 process feature layered model MEMS CAD
  • 相关文献

参考文献9

  • 1[1]KOPPELMAN G M.OYSTER, a threedimensional structure simulator for microelectromechanical design[J].Sensors and Actuators, 1989,20:179-185.
  • 2[2]OSTERBERG P M, SENTURIA S D. MemBuilder:an automated 3D solid model construction program for microelectromechanical structures[A]. Proc. of the 8th International Conference on Solid-State Sensors and Actuators(Transducers'95) and EuroSensors IX[C] . Stockholm, Sweden:IEEE,1995.21-24.
  • 3[3]DEVOE D L, GREEN S B,JUMP J M.Automated solid model extraction for MEMS visualization[A] .Technical Proceedings of the 1998 International Conference on Modeling and Simulation of Microsystems(MSM'98)[C].Computational Publications,1998.292-297.
  • 4[4]ANANTHAKRISHNAN V. Part-to-art:basis for a systematic geometric design tool for surface micromachined MEMS[D].Toledo,Ohio:Univ. of Toledo,2000.
  • 5[5]ANANTHAKRISHNAN V,SARMA R,ANANTHASURESH G K.Systematic mask synthesis for surface micromachined microelectromechanical systems[J]. Journal of Micromechanics and Microegineering(IOP),2003,13:927-941.
  • 6[6]GAO F, HONG S Y, SARMA R.Feature model for surface micro-machined MEMS[A]. Proceedings of the 2003ASME Design Engineering Technical Conference[C].Chicago,Illinois,USA:ASME,DETC2003/CIT-48186.
  • 7[8]LONG M K. Computer aided mask layout synthesis for anisotropic etch photolithography[D].California,USA:California Institute of Technology, 1999.
  • 8[9]LI H. Evolutionary techniques applied to mask-layout synthesis in micro-mechanical-electronic systems(MEMS)[D].Pasadena CA:, California Institute of Technology,1999.
  • 9[10]KOESTER D, COWEN A, MAHADEVAN R, et al. PolyMUMPs design handbook revision 8.0[Z]. MEMSCAP,2002.

同被引文献18

  • 1[2]Shuichi Yamamoto, Tokuo Kure, Masanori Ohgo,et al. A Two-dimensional Etching Profile Simulator: ESPRIT. IEEE, 1987,6(3):417~422
  • 2[3]Zhou R C, Zhang H X, Hao Y L,et al. Simulation of the Bosch Process with a String-cell Hybrid Method. IOP Publishing Ltd, 2004,14:851~858
  • 3[4]Bhardwaj J, Asharf H, McQuarrie. Dry Silicon Etching for MEMS Presented at The Symposium on Microstructrues and Microfabricated Systems at the Annual Meeting of the Eclectromechanical Society.Surface Technology System Limited, Montreal,Quebec, Canada, 1997
  • 4[5]Tina J, Cotler ,Ann Arbor. Reactive-ion-etch Profile Evolution Determined by a Monte Carlo Microtopography Model. J. Vac. Sci. Technol. B,1990,8(3): 523~528
  • 5[6]Strasser E, Selberherr S. Algorithm and Models for Cellular Based Topography Simulation. IEEE Transactions on Computer-aided Design of Integrated Circuits and Systems, 1995, 14 (9): 1104~1114
  • 6[7]Scheckler E W, Neureuther A R. Models and Algorithms for Three-Dimensional Topography Simulation with SAMPLE-3D. IEEE Transactions on Computer-aided Design of Integrated Circuits and Systems, 1994,13 (2): 219~ 230
  • 7Di Cheng,Kazuo Sato,Mitsuhiro Shikida,et al.Development of quartz etching database and 3 D micromachining simulation system [A].2003 International Symposium on Micromechantronies and Human Science,IEEE,2003,3:281~285
  • 8O.Than,S.Buttgenbach.Simulation of anisotropic chemical etching of crystalline silicon using a cellular automata model[J].Sens.Actuators,1994,A45:85-88
  • 9Zhenjun Zhu,Chang Liu.Micromachining process simulation using a continuous cellular automata method[J].Journal of Microelectromechanical Systems,2000,9(2):252-261
  • 10Rongchun Zhou,Haixia Zhang,Yilong Hao,et al.Simulation of profile evolution in etching-polymerization alternation in DRIE of silicon with SF6/C4F8[A].IEEE,2003,3:161-164

引证文献3

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部