摘要
通过有限元法分析膜厚均匀性,提出一种提高DWDM镀膜有效面积的方法———首先找到对蒸发膜料发射特性n最不敏感的镀膜机基板高度h,然后加入挡板修正膜厚均匀性,通过该方法,可使镀膜有效面积提高数十倍。并讨论了挡板加工精度对膜厚均匀性的影响。
In the paper,the thickness uniformity of thin films is analyzed by finite-elements method.A method to enlarge the effective area of DWDM filter manufacturing is also suggested —to find the substrate height which is the most insensitive to the parameter of emission character,then affiliate a correction mask,therefore largely increase the effective area.Finally the machining precision of correction mask is discussed.
出处
《激光与红外》
CAS
CSCD
北大核心
2003年第6期463-465,共3页
Laser & Infrared