电磁脉冲辐照所致下丘脑神经细胞膜穿孔的原子力显微镜研究

The atomic force microscopic study on the hypothalamus neuron membrane perforation induced by EMP

目的 :应用原子力显微镜检查术 (atomicforcemicroscopy,AFM)对电磁脉冲辐照前后培养的下丘脑神经细胞膜进行观察 ,以探讨电磁脉冲对其细胞膜影响的直接证据。方法 :对新生的Wistar乳大鼠下丘脑神经细胞在 6孔板中进行原代培养 ,在培养 14d时 ,用高场强电磁脉冲模拟源 (场强为 6× 10 4 V m ,脉冲上升时间 2 0ns,脉宽 30 μs)以 2 .5次 min ,辐照 2min。辐照后即刻固定细胞 ,应用AFM对细胞表面进行接触式连续扫描。结果 :电磁脉冲辐照后即刻就可引起下丘脑神经细胞膜表面大小不一、深度不同、类圆形和不规则形的穿孔 ,穿孔最大直径为 2 73.2 1～330 .10nm ,深度达 13.5 7nm。结论 :电磁脉冲辐照后可直接导致下丘脑神经元细胞膜的穿孔 ,提示其可能是电磁脉冲生物效应的损伤机制之一。

Objective:Using the atomic force microscopy (AFM) to observe the membrane surface changes of rat′s hypothalamus primary culture neurons irradiated by electromagnetic pulse (EMP) and to explore mechanism of injurious effect of EMP on nerve cell membrane.Methods:Nerve cells of hypothalamus of neonatal rats were cultured on 6-well plate. About 14 days later, the cells were exposed to EMP (with electric field intensity 60 kV/m, 20 ns rise time and 30?μs pulse wide) for 5 times in 2 min. The exposed cells were fixed immediately following irradiation and scanned by AFM.Results:The results showed that there were membrane perforations with different shapes, sizees(273.21-330.10?nm) and depths(13.57?nm) in the EMP irradiated neurons.Conclusions:EMP could cause the membrane perforations of hypothalamus nerve cells, suggesting that the membrane perforation be probably one of the injurious mechanisms of electromagnetic pulse.