摘要
作者从稳定蒸Al工艺、控制好Al-Si簿膜中Si含量及分布的目的出发,用Auger能谱对双枪电子束蒸发淀积的Al-Si簿膜进行了测试。弄清了Si含量及分布,得到了一些实用结果,为蒸Al工艺的优化提供了依据。
In order to make evaporation Al technology stable and content and distribution of Si in the Al-Si film wery well, the Al-Si film deposited in double-gan electron beam evaparction equipment is analyzed by AES. We understand the Si content and distribution and put forward the concept of quantity. In another, some useful results are obstained, which are used as the reference materials for optimizing technology.
出处
《微电子学与计算机》
CSCD
北大核心
1992年第5期18-20,共3页
Microelectronics & Computer
关键词
蒸发
Al-Si薄膜
硅
Evaporation, Al-Si films, Si content and distribution, Buffer layer, Maximun solid melting content
