应用等离子体化学反应的高频离子源中气压对引出金属离子和卤素离子含量的影响

EFFECT OF GAS PRESSURE ON PERCENTAGES OF METAL AND HALOGEN IONS EXTRACTED FROM HF ION SOURCE BY APPLYING PLASMA CHEMICAL REACTION

高频离子源中等离子体化学反应引出金属和卤素离子的实验中,存在一个规律性的东西。那就是,放电室内的气压在工作范围内变化时,离子束中金属离子和卤素离子的含量也都随之改变。当气压升高时,金属离子的百分比增大,卤素离子的百分比减小;反之,金属离子的比率下降,而卤素离子的比率上升。本文对这样一个事实进行了一些讨论。

A law exists in experiments by which the metal and halogen ions are extracted from HF ion source by applying plasma chemical reaction.As the gas pressure in discharge chamber varies within the operation range the percentages of metal and halogen ions in total beam current vary with it. When the pressure goes up the percentage of metal ions increases and the one of halogen ions decreases respectively, and vice versa. Some discussions about the experimental results are given.