摘要
本文回顾了低压合成金刚石的历史,对各种金刚石薄膜的生长方法进行了简要的对比。低压条件下金刚石处于亚稳态而石墨处于稳定相,本文重点介绍了低压条件下抑制石墨形成促进金刚石生长的关键因素。对金刚石在不同衬底上的成核状况,衬底的表面状况对成核的影响,生长过程中原子氢的作用,以及衬底温度的影响等作了概括,提出了目前阶段金刚石薄膜研究中所要解决的问题。
The history of low pressure diamond deposition and recent progresses are reviewed. The advantages and drawbacks of different diamond deposition methods are compared breifly. At low pressure condition diamond is in metas-
table phase and graphite is in stable phase. Therefore, we mainly describe the key factors of promoting diamond growth and restraining graphite formation at low pressure. Diamond nucleation on different substrates, substrate
surface conditions effect on nucleation, the role of atomic hydrogen in growth process, and the influence of substrate temperature are summaried. The future of diamond films are also outlined.
出处
《微细加工技术》
1992年第3期46-52,共7页
Microfabrication Technology
