用于微电子材料快速处理的新型大面积电子束的研制

Investigation of Large Area Electron Beam for Microelectron Material Processing

本文报导了一种新型电子束源的研究结果。这种电子枪能高效率地(70%)提供KeV的大面积(75cm^2)电子束。文中给出了电子枪的基本构造、伏安特性和束电子产生效率的计算和实测。它可用于微电子材料快速热处理。

A Kilovolt electron beam (1-5 KeV) with a large uniform area (75cm) has been used for the rapid processing of microelectronic films. Based on the abnormal glow discharge, the electron guns with an aluminium cathode, surrounded by a quartz tube, creates the beam electrons. The geometric gun structure, its curreut-voltage curves and the energy spectrum of beam elec- trons are given. The efficiency of creating beam electrons is up to 70% by measurement. Spatial uniformity of the circular electron beam 10 cm in dia- meter is better than 9%. The applications of the electron beam to microelec- tronics, such as the annealing of ion implanted silicon wafers and the forma- tion of refractory metal silicides are reported herein.