摘要
本文综述了酚醛 重氮萘醌正性抗蚀剂的溶解抑制机理,主要包括(1)分子间氢键作用机理;(2)偶联反应机理;(3)两步即静态、动态溶解抑制机理;(4)表面沉积溶解抑制机理;(5)酚醛树脂的分子溶解及相关的抑制机理.
The mechanisms of dissolution inhibition of positive photoresist based on novolak(NVK)-diazonaphthoquinone(DNQ),including(1) the molecular hydrogen bonding interactions between novolak and DNQ;(2) mechanism of the azoxy- or azo-coupling reaction of DNQ-ester with novolak resin;(3) the two-step mechanism (also named static and dynamic inhibition) of dissolution inhibition;(4) mechanism of the surface of the photoresist;(5) the molecular dissolution of novolak related to the mechanism of inhibition,was reviewed in this paper.
出处
《感光科学与光化学》
SCIE
EI
CAS
CSCD
北大核心
2004年第1期33-43,共11页
Photographic Science and Photochemistry
关键词
酚醛树脂
重氮萘醌
正性抗蚀剂
溶解抑制
novolak
diazonaphthoquinone
positive photoresist
dissolution inhibition
