摘要
采用溶胶 凝胶工艺制备了SiO2与ZrO2单层介质膜,用输出波长1.06μm,脉宽15ns的电光调Q激光系统产生的强激光进行辐照实验。观察了光学薄膜经强激光辐照后的损伤情况,讨论了溶胶 凝胶光学薄膜在强激光照射下的损伤机理,提出了溶剂替换、紫外光处理、添加有机粘接剂等提高溶胶 凝胶光学薄膜激光损伤阈值的方法。
In this paper, colloidbased singlelayer SiO2 and ZrO2 thin films were deposited on K9 glass and silicon wafer substrates by SolGel spincoating method. The films were irradiated by a Qswitched Nd:YAG high power laser whose wavelength was 1064nm and its pulse width was 15ns. The morphologies of the damaged films were observed by SEM and microscope. Damage mechanics of the laser were studied. The results show that solventexchange , UVirradiation and the addition of PVP are effective methods to improve the laser damage threshold of SolGel thin films. .
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2003年第5期439-443,共5页
High Power Laser and Particle Beams
基金
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