ZnO薄膜的择优取向生长

ZnO Film Growth in a Preferred Orientation

ZnO薄膜是一种具有广泛用途的材料,近来成为了研究的热点。高度c轴择优取向是优质ZnO薄膜的重要特点。在已开发的众多生长技术中,磁控溅射、金属有机物气相沉积、脉冲激光沉积、分子束外延、电子束反应蒸镀法是生长出高度c轴择优取向优质薄膜的主要方法。介绍了这些方法及其研究进展,同时介绍了目前ZnO薄膜主要研究方面。

ZnO films have a wide variety of applications. Recently, they have come to the forefront of research. The strong c-axis orientation is one of characteristics of high-quality ZnO films. ZnO films can be deposited by a variety of deposition techniques. Magnetron sputtering, metal-organic chemical vapor deposition, pulsed laser deposition, molecular beam epitaxy and reactive e-beam evaporation are main methods for the preparation of high-quality ZnO films with strong c-axis orientation. In this work, the above methods and their developments are reviewed. Finally,current drections of research on ZnO films are described.