摘要
在IH(IntegratedHardenPolymerStereoLithography)技术和电子束光刻技术的基础上提出了电子束微三维光刻技术新概念。对其实现方法的可行性进行了简要的理论分析,并使用SDV-II型真空腔在约1.33Pa的真空下对环氧618、WSJ 202和苏州2号抗蚀剂进行了气化试验,得出了它们在真空中的气化实验结果,证明了电子束液态光刻的可行性。
Based on the IH (Integrated Harden Polymer Stereo Lithography)technique,a novel electron-beam micro-stereo-lithography method is presented and analyzed theoretically. Experiments have been made to investigate the gasification of epoxy resin-618, WSJ-202 and Suzhou-2 resist in SDV-II vacuum room with the vacuum of 1.33 Pa. The results show that some liquid resists are suitable for electron-beam stereo lithography in vacuum.
出处
《微细加工技术》
2003年第4期9-13,共5页
Microfabrication Technology
基金
山东省高科技发展基金资助项目(022090105)
