摘要
为解决研制深浮雕连续非球面微光学元件所面临的浮雕深度和面型控制这两大难点,选取吸收系数小的AZ9260正性光刻胶进行实验研究。提出了采用低温长时间前烘和连续升温后烘技术实现深浮雕结构和非球面面型的控制,并得到口径为300μm、抗蚀剂厚度为35.49μm、石英刻蚀深度为72.36μm双曲线柱面透镜的最佳光刻工艺参数。实验曲线与标准双曲线拟合所得最大误差为2.3637μm,均方根差为0.9779μm。
To solve the two key techniques-relief deepness and profile control, which are arisen in fabricating the deep relief successive non-sphere micro-optical devices, the positive resist AZ9260 of small absorption coefficient is selected for the experimental research. The pre-bake of low temperature and long time and the post-bake of successively increasing temperature are proposed to acquire the deep relief structure and non-sphere profile control.The optimal process parameters for making the hyperbola column lens with the caliber of 300 μm,resist thickness of 35.49 μm and quartz etching depth of 72.36 μm are obtained. The maximum error and mean-root-square error between the experimental curve and the standard hyperbola are 2.3637 μm and 0.977 9 μm, respectively.
出处
《微细加工技术》
2003年第4期22-26,共5页
Microfabrication Technology
基金
中科院知识创新方向性基金资助项目(KGCX2-402)