摘要
We report a laser writing system for fabrication of diffractive optical elements with He-Cd laser. The wavelength of the light source is 441.6 nm. The output beam is collimated into parallel light with uniform intensity distribution after passing through the spatial filter with a pinhole of 25μm and the collimating device. A microscopy objective lens with numerical aperture (NA) of 0.65 is used to focus the beam into a small diffraction spot. Any pattern can be written with this system. Experimental results are presented. The written gratings and the phase patterns were verified with a conventional optical microscopy and the Taylor Hobson equipment.
We report a laser writing system for fabrication of diffractive optical elements with He-Cd laser. The wavelength of the light source is 441.6 nm. The output beam is collimated into parallel light with uniform intensity distribution after passing through the spatial filter with a pinhole of 25μm and the collimating device. A microscopy objective lens with numerical aperture (NA) of 0.65 is used to focus the beam into a small diffraction spot. Any pattern can be written with this system. Experimental results are presented. The written gratings and the phase patterns were verified with a conventional optical microscopy and the Taylor Hobson equipment.
基金
This work was supported by the National Outstanding Youth Foundation of China under Grant No.60125512and Program of Shanghai Subject Chief Scientist under Grant No.XD14005
