摘要
采用磁控溅射的方法来制备ZnO纳米薄膜。薄膜的晶体特性以及表面结构主要通过X射线衍射。
ZnO nano films were prepared using RF magnetic sputtering technology in different conditions. The properties of film crystal and surface morphology were characterized by X-ray diffraction, scanning electron microscopy, and atomic force microscopy.
出处
《微纳电子技术》
CAS
2003年第7期550-551,共2页
Micronanoelectronic Technology
基金
国家自然科学基金重大研究计划(90 2 0 60 3 9)
国家重点基础研究发展规划 (0 0 1CB610 5 0 5)
