真空弧源沉积类金刚石薄膜及其性能研究

The properties of DLC films synthesized by vacuum arc source deposition

采用真空孤源沉积技术在钛舍金及Si(100)表面合成DlLC薄膜,通入不同的氩气,控制DLC薄膜中的SP3/SP2比值。研究表明,薄膜硬度可达96GPa,随着氩气流量的增加,薄膜的硬度先增加,后有明显降低。随着氩气流量的增加,类金刚石薄膜中,SP2键增加,SP3键减少,而血液相容性明显提高。DLC薄膜具有优异的耐磨性,摩擦系数低,与钛合金基体结合牢固。

The DLC films were synthesized on the Ti6A14V and Si(100) substrate by vacuum were source deposition. The DLC films with different concentration ration of SP3 versus SP2 bonded carbon atoms were synthesized by bled different argon gas. The nano-hardness of the DLC film can reach 96GPa. The nano-hardness first increased and then decreases as the argon inlet increasing. When the argon inlet increased, the concentration ration of SP3 versus SP2 bonded carbon atoms decreased, but the blood compatibility of the DLC films increased. The DLC films have high wear resistance, low friction and good adherence with Ti6Al4V.