盐酸含量对光固化聚氨酯丙烯酸酯/SiO_2杂化材料结构和性能的影响

Effects of Hydrochloric Acid Content on the Structure and Properties of UV -Curable Polyurethane-Acrylate/SiO2 Hybrid Material

由正硅酸乙酯水解制得的SiO_2溶胶,在以γ-甲基丙烯酰氧丙基三甲氧基硅烷(TWSPM)为偶联剂的体系中,经溶胶-凝胶法制备了透明的光固化聚氨酯丙烯酸酯杂化材料[(PUA-TMSPM)/SiO_2]。研究了盐酸浓度对(PUA-TMSPM)/SiO_2结构与性能的影响。结果表明:随着pH值减小,硅溶胶体系和(PUA-TM-SPM)/SiO_2杂化体系的热稳定性增大;盐酸摩尔分数 X_(HCL)的增加使(PUA-TMSPM)/SiO_2光固化膜表面的两相界面结合更紧密,涂层变得更致密,并导致膜的硬度和耐磨性提高。

Silica sol (SiO2) was synthesized through the hydrolysis of tetraethoxysilane by using hydrochloric acid as a catalyst. UV curable, transparent hybrid material of urethane-acrylate resin(UA) with SiO2 was .prepared by the sol-gel process, u-sing 3-( trimethoxysilyl) propoxymethacrylate (TMSPM) as a coupling agent between the organic and inorganic phases. Experiments were carried out to study the effects of the content of hydrochloric acid on the structure and properties of UV-curable polyu-rethane-acrylate/silica hybrid (PUA-TMSPM)/SiO2 material. The results indicate that the stability of both silica sol and (PUA-TMSPM)/SiO2 system increase with the pH value decreasing. It is found that with the increase of HCl content, the interfacial interaction between organic and inorganic phases has strengthened, as a consequence, the photocured products show enhanced hardness and abrasion resistance.