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胡萝卜黑斑病抗性的动态遗传分析 被引量:2

Dynamic Genetic Analysis of Resistance to Alternaria Leaf Blight in Carrot
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摘要 采用加性-显性遗传模型,利用19份橘色胡萝卜试材配制63个杂交组合,研究3个发病时期下黑斑病抗性的动态遗传规律。结果表明,各时期的遗传效应以加性效应为主,在发病中期和晚期(V_A=0.656和0.551)达到显著水平,并且在发病中期显著增加,说明该时期是挖掘相关抗病基因的适宜时期;显性效应在发病晚期显著增加,达到最高值(V_D=0.311)。黑斑病抗性存在显著的狭义遗传率和广义遗传率,最高为0.574和0.827,说明通过选择抗性亲本可以提高后代的抗病性。获得5份可以显著增加后代黑斑病抗性的亲本材料P12、P14、P15、P16、P17。 Taking additive-dominance genetic model,and using 19 orange carrot lines as experiment material to prepare their 63 F1 crosses,this paper studied the dynamic genetic law of Alternaria leaf blight resistance during 3 stages.The results indicated that the additive effect was the major genetic effect,which reached significant level during median and late stages(VA=0.656 and 0.551)and increased significantly in median stage,indicating that this stage was the suitable time to study related resistant genes.The dominance effect was increased significantly and reached the highest value(VD=0.311)in late stage.There were narrow heritability and broad heritability existed in Alternaria leaf blight resistence.The highest were 0.574 and 0.827,indicating that selecting resistant parent could improve disease resistance in offspring.Five parent materials,which could significantly improve Alternaria leaf blight resistence in offspring,were obtained.They were P12,P14,P15,P16,P17.
作者 欧承刚 曹琼文 赵志伟 任怀富 李成江 庄飞云 OU Cheng-gang;CAO Qiong-wen;ZHAO Zhi-wei;REN Huai-fu;LI Cheng-jiang;ZHUANG Fei-yun(Key Laboratory of Horticultural Crop Biology and Germplasm Innovation,Ministry of Agriculture and Rural Affairs,Institute of Vegetables and Flowers,Chinese Academy of Agricultural Sciences,Beijing 10008,China;Suzhou Academy of Agricultural Science,Suzhou 234000,Anhui,China;Xining Vegetable Institute,Xining 810016,Qinghai,China)
出处 《中国蔬菜》 北大核心 2019年第4期34-39,共6页 China Vegetables
基金 国家重点研发计划项目(2016YFD0100204-04) 中国农业科学院科技创新工程项目(CAAS-ASTIP-IVFCAAS) 中国农业科学院科技创新工程协同创新任务(CAAS-XTCX2016017) 现代农业产业技术体系建设专项资金项目(CARS-25) 青海省重点研发与转化计划项目(2017-NK-150)
关键词 胡萝卜 黑斑病 抗性 遗传分析 Carrot Alternaria leaf blight Resistance Genetic analysis
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