期刊文献+

A review on MBE-grown HgCdSe infrared materials on GaSb(211)B substrates 被引量:2

A review on MBE-grown HgCdSe infrared materials on GaSb(211)B substrates
下载PDF
导出
摘要 We review our recent efforts on developing HgCdSe infrared materials on Ga Sb substrates via molecular beam epitaxy(MBE) for fabricating next generation infrared detectors with features of lower production cost and larger focal plane array format size. In order to achieve high-quality HgCdSe epilayers, ZnTe buffer layers are grown before growing HgCdSe, and the study of misfit strain in ZnTe buffer layers shows that the thickness of ZnTe buffer layer needs to be below 300 nm in order to minimize the generation of misfit dislocations. The cut-off wavelength/alloy composition of HgCdSe materials can be varied in a wide range by varying the ratio of Se/Cd beam equivalent pressure during the HgCdSe growth.Growth temperature presents significant impact on the material quality of HgCdSe, and lower growth temperature leads to higher material quality for HgCdSe. Typically, long-wave infrared HgCdSe(x = 0.18, cut-off wavelength of 10.4 μm at 80 K) presents an electron mobility as high as 1.3×10~5cm^2·V^(-1)·s^(-1), a background electron concentration as low as 1.6×10^(16)cm^(-3), and a minority carrier lifetime as long as 2.2 μs. These values of electron mobility and minority carrier lifetime represent a significant improvement on previous studies of MBE-grown HgCdSe reported in the open literatures,and are comparable to those of counterpart HgCdTe materials grown on lattice-matched CdZnTe substrates. These results indicate that HgCdSe grown at the University of Western Australia, especially long-wave infrared can meet the basic material quality requirements for making high performance infrared detectors although further effort is required to control the background electron concentration to below 10^(15)cm^(-3). More importantly, even higher quality HgCdSe materials on GaSb are expected by further optimizing the growth conditions, using higher purity Se source material, and implementing postgrowth thermal annealing and defect/impurity gettering/filtering. Our results demonstrate the great potential of HgCdSe infrared materials grown on GaSb substrates for fabricating next generation infrared detectors with features of lower cost and larger array format size. We review our recent efforts on developing HgCdSe infrared materials on Ga Sb substrates via molecular beam epitaxy(MBE) for fabricating next generation infrared detectors with features of lower production cost and larger focal plane array format size. In order to achieve high-quality HgCdSe epilayers, ZnTe buffer layers are grown before growing HgCdSe, and the study of misfit strain in ZnTe buffer layers shows that the thickness of ZnTe buffer layer needs to be below 300 nm in order to minimize the generation of misfit dislocations. The cut-off wavelength/alloy composition of HgCdSe materials can be varied in a wide range by varying the ratio of Se/Cd beam equivalent pressure during the HgCdSe growth.Growth temperature presents significant impact on the material quality of HgCdSe, and lower growth temperature leads to higher material quality for HgCdSe. Typically, long-wave infrared HgCdSe(x = 0.18, cut-off wavelength of 10.4 μm at 80 K) presents an electron mobility as high as 1.3×10~5cm^2·V^(-1)·s^(-1), a background electron concentration as low as 1.6×10^(16)cm^(-3), and a minority carrier lifetime as long as 2.2 μs. These values of electron mobility and minority carrier lifetime represent a significant improvement on previous studies of MBE-grown HgCdSe reported in the open literatures,and are comparable to those of counterpart HgCdTe materials grown on lattice-matched CdZnTe substrates. These results indicate that HgCdSe grown at the University of Western Australia, especially long-wave infrared can meet the basic material quality requirements for making high performance infrared detectors although further effort is required to control the background electron concentration to below 10^(15)cm^(-3). More importantly, even higher quality HgCdSe materials on GaSb are expected by further optimizing the growth conditions, using higher purity Se source material, and implementing postgrowth thermal annealing and defect/impurity gettering/filtering. Our results demonstrate the great potential of HgCdSe infrared materials grown on GaSb substrates for fabricating next generation infrared detectors with features of lower cost and larger array format size.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第1期116-125,共10页 中国物理B(英文版)
基金 Project supported by the Australian Research Council(Grant Nos.FT130101708,DP170104562,LP170100088,and LE170100233) Universities AustraliaDAAD German Research Cooperation Scheme(Grant No.2014-2015) supported by the WA node of Australian National Fabrication Facility(ANFF)
关键词 INFRARED DETECTOR HgCdSe GASB molecular beam EPITAXY infrared detector HgCdSe GaSb molecular beam epitaxy
  • 相关文献

同被引文献24

引证文献2

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部