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Laser-induced damage threshold in HfO_2/SiO_2 multilayer films irradiated by β-ray 被引量:1

Laser-induced damage threshold in HfO_2/SiO_2 multilayer films irradiated by β-ray
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摘要 Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO_2/SiO_2 multilayer films are prepared by e-beam evaporation and then β-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold(LIDT),which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm^2 to 12 J/cm^2, i.e., 50% increase, after the film has been irradiated by 2.2×10^(13)/cm^2 β-ray, the particle irradiation can be used as a controllable and desirable postprocessing method to improve the resistance to laser induced damage. Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO_2/SiO_2 multilayer films are prepared by e-beam evaporation and then β-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold(LIDT),which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm^2 to 12 J/cm^2, i.e., 50% increase, after the film has been irradiated by 2.2×10^(13)/cm^2 β-ray, the particle irradiation can be used as a controllable and desirable postprocessing method to improve the resistance to laser induced damage.
作者 Mei-Hua Fang Peng-Yu Tian Mao-Dong Zhu Hong-Ji Qi Tao Fei Jin-Peng Lv Hui-Ping Liu 方美华;田鹏宇;朱茂东;齐红基;费涛;吕金鹏;刘会平(College of Astronautics,Nanjing University of Aeronautics&Astronautics;Laboratory of Thin Film Optics,Key Laboratory of Materials for High Power Laser,Shanghai Institute of Optics and Fine Machanics,Chinese Academy of Sciences;Institute of Modern Physics,Chinese Academy of Sciences)
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第2期294-298,共5页 中国物理B(英文版)
基金 Project supported by the National Natural Science Foundation of China(Grant No.11405085) the Jiangsu Provincial Natural Science Fund,China(Grant No.BK20130789)
关键词 Β-RAY IRRADIATION HFO2/SIO2 multilayer film residual stress LASER-INDUCED damage threshold β-ray irradiation HfO2/SiO2 multilayer film residual stress laser-induced damage threshold
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