摘要
In this paper, we present a 1.8-kV circular AlGaN/GaN/AlGaN double-heterostructure high electron mobility transistor(DH HEMT) with a gate-drain spacing L_(GD)= 18.8 μm. Compared with the regular DH HEMT, our circular structure has a high average breakdown electric-field strength that increases from 0.42 MV/cm to 0.96 MV/cm. The power figure of meritV_(BR)~2/RON for the circular HEMT is as high as 1.03 ×10~9 V^2·Ω^(-1)·cm^(-2). The divergence of electric field lines at the gate edge and no edge effect account for the breakdown enhancement capability of the circular structure. Experiments and analysis indicate that the circular structure is an effective method to modulate the electric field.
In this paper, we present a 1.8-kV circular AlGaN/GaN/AlGaN double-heterostructure high electron mobility transistor(DH HEMT) with a gate-drain spacing L_(GD)= 18.8 μm. Compared with the regular DH HEMT, our circular structure has a high average breakdown electric-field strength that increases from 0.42 MV/cm to 0.96 MV/cm. The power figure of meritV_(BR)~2/RON for the circular HEMT is as high as 1.03 ×10~9 V^2·Ω^(-1)·cm^(-2). The divergence of electric field lines at the gate edge and no edge effect account for the breakdown enhancement capability of the circular structure. Experiments and analysis indicate that the circular structure is an effective method to modulate the electric field.
基金
Project supported by the National Key Research and Development Program of China(Grant No.2016YFB0400100)
the National Natural Science Foundation of China(Grant Nos.11435010,61474086,and 61804125)
the Natural Science Basic Research Program of Shaanxi Province,China(Grant No.2016ZDJC-02)
