纳秒脉冲驱动下铝基微沟道等离子体放电特性研究

Discharge Characteristics of Novel Aluminum-Based Microchannel Plasma Driven by Nanosecond Pulse

本文设计制作了基于铝基衬底的微沟道阵列器件,并研究了纳秒脉冲微沟道等离子体放电特性。通过调控纳秒脉冲输出波形,获得了脉冲参数对微沟道等离子体放电特性的影响规律。结果表明,相比于传统的正弦波驱动,纳秒脉冲微沟道等离子体放电更集中,耦合效应更明显,且等离子体特性更易于调控。当改变脉冲参数时,6%左右的波形过冲电压会造成微沟道等离子体放电强度~30%的改变。另外,脉冲上升沿时间越短,放电强度越高,当上升沿时间由152 ns缩短至32 ns时,放电强度可提升~30%。

A novel type of microchannel array device was fabricated on aluminum substrate and the discharge characteristics of the microchannel plasma driven by bipolar nanosecond(ns)pulse were investigated.The plasma discharge driven by bipolar ns-pulse outperforms that driven by sinusoidal waveform,because of a higher concentration,a more obvious coupling and a more easiness to control.The influence of the overshoot voltage and pulse rising time of bipolar ns-pulse properties on the micro-plasma behavior was evaluated.The preliminary results show that the properties of bipolar ns-pulse have a major impact.To be specific,an overshoot voltage of 6%produced a change by 30%of the microchannel plasma discharge intensity.In addition,a decrease of the rising time,from 152 ns to 32 ns,increased the plasma discharge intensity by 30%.